最近の出版論文目録 -recently published papers

■ 最近の出版論文目録 ■
- recently published papers -

最近の国際学術論文 - Recently Published International Papers

H. Kinoshita: Fowler-Nordheim Tunneling, Photovoltaic Applications and New Band Structure Models of Electroconductive a-CN_x:H Films Formed by Supermagnetron Plasma CVD, J. Mod. Phys., 7 (2016) 2008.

H. Kinoshita, S. Suzuki, R. Taguchi and H. Takeuchi: Field Electron-Emission from a-CN_x:H Films Formed on Al Films Using Supermagnetron Plasma CVD, J. Mod. Phys., 6 (2015) 1602.

H. Kinoshita and S. Yagi: Chemical Vapor Deposition of a-CN_x:H Films for Electron Field Emission Using Band Supermagnetron Plasma, J. Phys.: Conf. Ser., 518 (2014) 012004.

H. Kinoshita, Y. Ninomiya and T. Kato: N₂ or H₂/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CN_x Films for Application to Elementary Amorphous CN_x:H/p-Si Photovoltaic Cell, Jpn. J. Appl. Phys., 52 (2013) 116201.

H. Kinoshita, S. Yagi and M. Sakurai: Deposition of a-CN_x:H Films Using Uniform Supermagnetron Plasma under a Stationary Magnet Field, J. Mod. Phys., 4 (2013) 587.

H. Kinoshita, M. Kubota and G. Ohno: Deposition of Amorphous Carbon Films Using Ar and/or N₂ Magnetron Sputter with Ring Permanent Magnet, Thin Solid Films, 523 (2012) 52.

H. Kinoshita and S. Tanaka: Isobutane/N₂ Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications, Jpn. J. Appl. Phys., 49 (2012) 08HF04.

H. Kinoshita and H. Suzuki: Pulsed Supermagnetron Plasma CVD of a-CN_x:H Electron-Transport Films for Au/a-CN_x:H/p-Si Photovoltaic Cells, J. Mod. Phys., 2 (2011) 398.

H. Kinoshita and A. Yamaguchi: Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films, Jpn. J. Appl. Phys., 49 (2010) 08JF07.

H. Kinoshita, M. Kubota and G. Ohno: Deposition of Amorphous Carbon Nitride Films Using Ar/N₂ Supermagnetron Sputter, Thin Solid Films, 518 (2010) 3502.

H. Kinoshita, M. Kiyama and H. Suzuki: Supermagnetron Plasma CVD of Highly Effective a-CN_x:H Electron-Transport and Hole-Blocking Films Suited to Au/a-CN_x:H/p-Si Photovoltaic Cells, Thin Solid Films, 517 (2009) 4218.

K. Sakurai, H. Kinoshita, G. Ohno, Y. Nakanishi and M. Kubota: Luminescence Properties of Amorphous Carbon Films Formed Using Supermagnetron Plasma, Jpn. J. Appl. Phys., 47 (2008) 7216.

H. Kinoshita and K. Sakurai: Oxidation of Amorphous Carbon Films by Ultraviolet Light Irradiation and Thermal Annealing, Jpn. J. Appl. Phys., 47 (2008) 7002.

H. Kinoshita, R. Ikuta and T. Yamaguchi: Sputter-assisted Plasma CVD of Wide or Narrow Optical Bandgap Amorphous CN_x:H Films Using i-C₄H₁₀/N₂ Supermagnetron Plasma, Thin Solid Films, 516 (2008) 4441.

H. Kinoshita, M. Yamashita and T. Yamaguchi: Surface Etching Effects of Amorphous C:H and CN_x:H Films Formed by Supermagnetron Plasma for Field Emission Use, Thin Solid Films, 516 (2008) 3656.

H. Kinoshita and M. Yamashita: Field-emission Characteristics of Diamond-like Amorphous Carbon Films Deposited by Mixed Gas (N₂ or H₂) Controlled i-C₄H₁₀ Supermagnetron Plasma, Thin Solid Films, 515 (2007) 5142.

H. Kinoshita, R. Ikuta and K. Sakurai: Sputter-Assisted Plasma CVD of Polymer-Like Amorphous-CN_x:H Films Using Supermagnetron Plasma, Thin Solid Films, 515 (2007) 4121.

H. Kinoshita, M. Yamashita and T. Yamaguchi: Diamond-Like Amorphous Carbon Films Deposited for Field-Emission Use by Upper-Electrode-RF-Power-Controlled Supermagnetron Plasma, Jpn. J. Appl. Phys., 45 (2006) 8401.

H. Kinoshita, R. Ikuta and K. Sakurai: Formation of Wide and Narrow Optical-Band-Gap Amorphous-CN_x:H Films Using i-C₄H₁₀/N₂ Supermagnetron Plasma, Appl. Surf. Sci., 244 (2005) 314.

H. Kinoshita, T. Murakami and F. Fukushima: Chemical Vapor Deposition of SiO₂ Films by TEOS/O₂ Supermagnetron Plasma, Vacuum, 76 (2004) 19.

H. Kinoshita, R. Ikuta and S. Murakami: Deposition and Field-Emission Characterization of Electrically Conductive Nitrogen-Doped Diamond-Like Amorphous Carbon Films, J. Vac. Sci. Technol. A, 22 (2004) 1857.

H. Kinoshita and N. Otaka: Influence of Plasma Heating of Wafer Substrates on SiO₂ Deposition Rate in a TEOS/O₂ High-Density Plasma CVD System, Vacuum, 74 (2004) 99.

H.Kinoshita and N.Otaka: Physical Properties of Nitrogen-Doped Diamond-Like Amorphous Carbon Films Deposited by Supermagnetron Plasma CVD, J. Vac. Sci.Technol. A, 20 (2002) 1481.

H. Kinoshita and T. Murakami: Intermittent Chemical Vapor Deposition of Thick Electrically Conductive Diamond-Like Amorphous Carbon Films Using i-C₄H₁₀/N₂ Supermagnetron Plasma, J. Vac. Sci. Technol. A, 20 (2002) 403.

H. Kinoshita and M. Yoshida: Supermagnetron Plasma Chemical Vapor Deposition and Qualitative Analysis of Electrically Conductive Diamond-like Amorphous Carbon Films, J. Vac. Sci. Tecnol. A, 19 (2001) 1577.

H. Kinoshita, T. Hando and M.Yoshida: Preparation of Electrical Conductive Diamond-Like Carbon Films Using i-C₄H₁₀/N₂ Supermagnetron Plasma, J. Appl. Phys., 89 (2001) 2737.

H. Kinoshita, J. Takahashi and T. Hando: Electrical Conductive Hard-Carbon (DLC) Films Formed by i-C₄H₁₀/N₂ Supermagnetron Plasma Chemical Vapor Deposition Method, Thin Solid Films, 373 (2000) 251.

H. Kinoshita, F. Fukushima, M. Kando, Y. Nakagawa and T. Tsukada: Probe Diagnostics of Supermagnetron Plasma with Applications of Continuous and Pulse-Modulated Rf Electric Fields, J. Appl. Phys., 88 (2000) 2263.

K. Sawada, H. Kinoshita, T. Masuda and M. Ishida: Noise Characteristics of Emission Current from Conductive Diamond-Like Carbon Thin Films Coating on Cone Shaped Silicon Field Emitters, J. Vac. Sci. Tecnol. B, 18 (2000) 1044.

H. Kinoshita, S. Nomura and M. Honda: Thickness-Distribution of Large-Area DLC Films Formed by CH₄/H₂ Supermagnetron Plasma Chemical Vapor Deposition with Application of a Stationary Magnetic Field, J. Vac. Sci. Tecnol. A, 18 (2000)367.

H. Kinoshita, M. Honda, T. Tatsuta and F. Sakiya: Analysis of the Negative Ion Characteristics of O₂ Supermagnetron Plasma for Submicron Etching Use, Vacuum, 55 (1999) 219.

H. Kinoshita: Sub-Half Micron Etching of Resist below Room Temperature Using O₂ Supermagnetron Plasma, Vacuum, 55(1999)77.

H. Kinoshita, S. Nomura, Y. Nakagawa and T. Tsukada: Evaluation of Self-Bias Potential Distribution on a Powered Electrode of Supermagnetron Plasma Apparatus, J. Appl. Phys., 86 (1999) 1208.

H. Kinoshita, A. Yamauchi and M. Sawai: High-Resolution Resist Etching for Quartermicron Lithography Using O₂/N₂ Supermagnetron Plasma, J. Vac. Sci. Technol. B, 17 (1999) 109.